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1

A Fundamental Study on Dissolution Behavior of High-Resolution Molecular Glass Photoresists

Silva, Anuja De, Sundberg, Linda K., Ito, Hiroshi, Sooriyakumaran, Ratnam, Allen, Robert D., Ober, Christopher K.

Journal:

Chemistry of Materials

Year:

2008

Language:

english

File:

PDF, 694 KB

english, 2008

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Extending photo-patternable low-κ concept to 193nm lithography and e-beam lithography

Lin, Qinghuang, Allen, Robert D., Somervell, Mark H., Nelson, A., Bozano, L., Brock, P., Cohen, S., Davis, B., Kwong, R., Liniger, E., Neumayer, D., Rathore, J. S., Shobha, H., Sooriyakumaran, R., Pur

Year:

2011

Language:

english

File:

PDF, 4.61 MB

english, 2011

3

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 16 September 2014)] Photomask Technology 2014 - Characterization of a new polarity switching negative tone e-beam resist for 14nm and 10nm logic node mask fabrication and beyond

Ackmann, Paul W., Hayashi, Naoya, Faure, T., Zweber, A., Bozano, L., Sanchez, M., Sooriyakumaran, R., Sundberg, L., Sakamoto, Y., Nash, S., Kagawa, M., Isogawa, T., Senna, T., Tanabe, M., Komizo, T.,

Year:

2014

Language:

english

File:

PDF, 5.04 MB

english, 2014

4

Enhancing water permeability of fouling-resistant POSS–PEGM hydrogels using ‘addition–extraction’ of sacrificial additives

Young-Hye La, Ratnam Sooriyakumaran, Bryan D. McCloskey, Robert D. Allen, Benny D. Freeman, Radwan Al-Rasheed

Journal:

Journal of Membrane Science

Year:

2012

Language:

english

File:

PDF, 1.31 MB

english, 2012

5

Novel thin film composite membrane containing ionizable hydrophobes: pH-dependent reverse osmosis behavior and improved chlorine resistance

La, Young-Hye, Sooriyakumaran, Ratnam, Miller, Dolores C., Fujiwara, Masaki, Terui, Yoshiharu, Yamanaka, Kazuhiro, McCloskey, Bryan D., Freeman, Benny D., Allen, Robert D.

Journal:

Journal of Materials Chemistry

Year:

2010

Language:

english

File:

PDF, 215 KB

english, 2010

6

Monomer Reactivities and Kinetics in Radical Copolymerization of Hydroxystyrene Derivatives and tert -Butyl (Meth)acrylate

Ito, Hiroshi, Dalby, Charlie, Pomerantz, Andrew, Sherwood, Mark, Sato, Rikiya, Sooriyakumaran, R., Guy, Kip, Breyta, Greg

Journal:

Year:

2000

Language:

english

File:

PDF, 176 KB

english, 2000

7

Synthesis of the elusive 1,8-bis(trimethylsilyl)naphthalene and its facile rearrangement to the 1,7 isomer

Sooriyakumaran, Ratnasabapathy, Boudjouk, Philip

Journal:

Organometallics

Year:

1982

Language:

english

File:

PDF, 282 KB

english, 1982

8

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Study and comparison of negative tone resists for fabrication of bright field masks for 14nm node

Zweber, Amy E., Abboud, Frank E., Faure, Thomas B., Faure, Tom, McGuire, Anne, Sundberg, Linda K., Sooriyakumaran, Ratnam, Sanchez, Martha I., Bozano, Luisa D., Senna, Tasuku, Fujita, Yuki, Negishi, Y

Year:

2012

Language:

english

File:

PDF, 1.15 MB

english, 2012

9

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms

Wallow, Thomas I., Brock, Phillip J., Di Pietro, Richard A., Allen, Robert D., Opitz, Juliann, Sooriyakumaran, Ratnam, Hofer, Donald C., Mewherter, Ann M., Cui, Yuping, Yan, Wendy, Worth, G., Moreau,

Year:

1999

Language:

english

File:

PDF, 1.31 MB

english, 1999

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - A new class of low bake resists for 193-nm immersion lithography

Henderson, Clifford L., Sooriyakumaran, Ratnam, DiPietro, Richard, Truong, Hoa, Brock, Phillip, Allen, Robert, Bozano, Luisa, Popova, Irene, Huang, Wu-Song, Chen, Rex, Khojasteh, Mahmoud, Varanasi, Pu

Year:

2008

Language:

english

File:

PDF, 634 KB

english, 2008

11

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Molecular design for stabilization of chemical amplification resist toward airborne contamination

Ito, Hiroshi, England, William P., Clecak, Nicholas J., Breyta, Gregory, Lee, Hoosung, Yoon, Do Y., Sooriyakumaran, Ratnam, Hinsberg, William D., Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 999 KB

english, 1993

12

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Building high-performance chemically amplified resists with polymer blends

Lin, Qinghuang, Fedynyshyn, Theodore H., Simons, John P., Angelopoulos, Marie, Sooriyakumaran, Ratnam

Year:

2002

Language:

english

File:

PDF, 597 KB

english, 2002

13

Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility.

ITO, Hiroshi, BREYTA, Greg, HOFER, Don, SOORIYAKUMARAN, R., PETRILLO, Karen, SEEGER, David

Journal:

Journal of Photopolymer Science and Technology

Year:

1994

Language:

english

File:

PDF, 584 KB

english, 1994

14

Evaluation of pharmacist-led physician-supported inpatient deprescribing model in older patients admitted to an acute general medical unit

Potter, Elizabeth Louise, Lew, Thomas Eliot, Sooriyakumaran, Manoshayini, Edwards, Alexandra Molly, Tong, Erica, Aung, Ar Kar

Journal:

Australasian Journal on Ageing

Year:

2019

Language:

english

File:

PDF, 267 KB

english, 2019

15

Einfache Wege zu Di-tert-butylsilandiyl: chemische, thermische und photochemische Erzeugung

Prof. Dr. Philip Boudjouk, Upasiri Samaraweera, Dr. Ratnasabapathy Sooriyakumaran, Dr. Jerzy Chrisciel, Kevin R. Anderson

Journal:

Angewandte Chemie

Year:

1988

Language:

german

File:

PDF, 231 KB

german, 1988

16

Convenient Routes to Di-tert-butylsilanediyl: Chemical, Thermal and Photochemical Generation

Prof. Dr. Philip Boudjouk, Upasiri Samaraweera, Dr. Ratnasabapathy Sooriyakumaran, Dr. Jerzy Chrusciel, Kevin R. Anderson

Journal:

Angewandte Chemie International Edition

Year:

1988

Language:

english

File:

PDF, 253 KB

english, 1988

17

1-Silaphenalenes, potential precursors to aromatic silylenium ions and aromatic silyl anions. Spectroscopic and chemical studies

Ratnasabapathy Sooriyakumaran, Philip Boudjouk

Journal:

Journal of Organometallic Chemistry

Year:

1984

Language:

english

File:

PDF, 571 KB

english, 1984

18

The reaction of magnesium with cis-1,3,5-tris(bromomethyl)cyclohexane. Evidence for a soluble tri-Grignard

Philip Boudjouk, Ratnasabapathy Sooriyakumaran, Craig A. Kapfer

Journal:

Journal of Organometallic Chemistry

Year:

1985

Language:

english

File:

PDF, 163 KB

english, 1985

19

Bifunctional hydrogel coatings for water purification membranes: Improved fouling resistance and antimicrobial activity

Young-Hye La, Bryan D. McCloskey, Ratnam Sooriyakumaran, Ankit Vora, Benny Freeman, Majed Nassar, James Hedrick, Alshakim Nelson, Robert Allen

Journal:

Journal of Membrane Science

Year:

2011

Language:

english

File:

PDF, 586 KB

english, 2011

20

The synthesis of 1-silaphenalanes from 1,8-difunctional naphthalenes. Confirmation of the structures of the pyrolysis products of (1-naphthyl)vinyldichlorosilane

Philip Boudjouk, John S. Kiely, Ratnasabapathy Sooriyakumaran

Journal:

Journal of Organometallic Chemistry

Year:

1981

Language:

english

File:

PDF, 977 KB

english, 1981

21

Polysilanes: Photochemistry and deep UV lithography

R. D. Miller, G. Wallraff, N. Clecak, R. Sooriyakumaran, J. Michl, T. Karatsu, A. J. McKinley, K. A. Klingensmith, J. Downing

Journal:

Polymer Engineering & Science

Year:

1989

Language:

english

File:

PDF, 497 KB

english, 1989

22

The synthesis and characterization of the first soluble, high molecular weight, substituted poly(diphenylsilane) homopolymers

R. D. Miller, R. Sooriyakumaran

Journal:

Journal of Polymer Science Part C: Polymer Letters

Year:

1987

Language:

english

File:

PDF, 340 KB

english, 1987

23

Soluble alkyl substituted polygermanes: Thermochromic behavior

R. D. Miller, R. Sooriyakumaran

Journal:

Journal of Polymer Science Part A: Polymer Chemistry

Year:

1987

Language:

english

File:

PDF, 906 KB

english, 1987

24

The synthesis of soluble, substituted silane high polymers by Wurtz coupling techniques

R. D. Miller, D. Thompson, R. Sooriyakumaran, G. N. Fickes

Journal:

Journal of Polymer Science Part A: Polymer Chemistry

Year:

1991

Language:

english

File:

PDF, 1.08 MB

english, 1991

25

Fluorescence of poly(di-n-alkylsilane)s in room-temperature solution

Ya-Ping Sun, Robert D. Miller, R. Sooriyakumaran, Josef Michl

Journal:

Journal of Inorganic and Organometallic Polymers and Materials

Year:

1991

Language:

english

File:

PDF, 1.62 MB

english, 1991

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Multilevel integration of patternable low-κ material into advanced Cu BEOL

Lin, Qinghuang, Chen, S. T., Nelson, A., Brock, P., Cohen, S., Davis, B., Fuller, N., Kaplan, R., Kwong, R., Liniger, E., Neumayer, D., Patel, J., Shobha, H., Sooriyakumaran, R., Purushothaman, S., Sp

Year:

2010

Language:

english

File:

PDF, 1.42 MB

english, 2010

27

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Acid-catalyzed pinacol rearrangement: chemically amplified reverse polarity change

Sooriyakumaran, Ratnam, Ito, Hiroshi, Mash, Eugene A., Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 801 KB

english, 1991

28

Studies of chain conformational kinetics in poly(di-n-alkylsilanes) by spectroscopic methods. III. Fourier transform Raman studies of unsymmetric side chain substitution

Hallmark, V. M., Sooriyakumaran, R., Miller, R. D., Rabolt, J. F.

Journal:

The Journal of Chemical Physics

Year:

1989

Language:

english

File:

PDF, 460 KB

english, 1989

29

Structural study of thermochromism in poly(di-n-alkylgermanes) by Raman spectroscopy in the visible and near infrared

Hallmark, V. M., Zimba, C. G., Sooriyakumaran, R., Miller, R. D., Rabolt, J. F.

Journal:

Year:

1990

Language:

english

File:

PDF, 636 KB

english, 1990

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Conductive layer for charge dissipation during electron-beam exposures

Bozano, Luisa D., Sooriyakumaran, Ratnam, Sundberg, Linda K., Sanchez, Martha I., Lofano, Elizabeth M., Rettner, Charles T., Nagasawa, Takayuki, Watanabe, Satoshi, Kawai, Yoshio, Palavesam, Nagarajan,

Year:

2012

Language:

english

File:

PDF, 4.40 MB

english, 2012

31

Poly(di-n-pentylsilane). The spectral consequences of a helical conformation in the solid state

Miller, R. D., Farmer, B. L., Fleming, W., Sooriyakumaran, R., Rabolt, J.

Journal:

Journal of the American Chemical Society

Year:

1987

Language:

english

File:

PDF, 922 KB

english, 1987

32

Alkoxy-substituted poly(diarylsilanes): thermochromism and solvatochromism

Miller, R. D., Sooriyakumaran, R.

Journal:

Year:

1988

Language:

english

File:

PDF, 403 KB

english, 1988

33

Laser desorption mass spectrometry of polysilanes

Magnera, Thomas F., Balaji, V., Michl, Josef, Miller, R. D., Sooriyakumaran, R.

Journal:

Year:

1989

Language:

english

File:

PDF, 2.14 MB

english, 1989

34

Characterization of Volatile Species Formed during Exposure of Photoresists to Ultraviolet Light

Houle, F. A., Deline, V. R., Truong, H., Sooriyakumaran, R.

Journal:

Year:

2007

Language:

english

File:

PDF, 142 KB

english, 2007

35

Variable-temperature carbon-13 and silicon-29 CPMAS NMR studies of poly(di-n-hexylsilane)

Gobbi, Gian C., Fleming, William W., Sooriyakumaran, R., Miller, Robert D.

Journal:

Journal of the American Chemical Society

Year:

1986

Language:

english

File:

PDF, 372 KB

english, 1986

36

The mechanism of the photochemical degradation of poly(di-n-alkylsilanes) in solution

Karatsu, Takashi, Miller, Robert D., Sooriyakumaran, Ratnasabapathy, Michl, Josef

Journal:

Journal of the American Chemical Society

Year:

1989

Language:

english

File:

PDF, 302 KB

english, 1989

37

Photodegradation of poly(dialkylsilane)s in solution: the persistent radicals have an unexpected structure

McKinley, Allan J., Karatsu, Takashi., Wallraff, Gregory M., Miller, Robert D., Sooriyakumaran, Ratnasabapathy., Michl, Josef.

Journal:

Organometallics

Year:

1988

Language:

english

File:

PDF, 425 KB

english, 1988

38

Organic sonochemistry. New ultrasonically accelerated reactions involving lithium

Boudjouk, Philip, Sooriyakumaran, Ratnasabapathy, Han, Byung Hee

Journal:

Journal of Organic Chemistry

Year:

1986

Language:

english

File:

PDF, 296 KB

english, 1986

39

The synthesis of the first spiropentasilane, octamethylsiropentasilane

Boudjouk, Philip, Sooriyakumaran, Ratnasabapathy

Journal:

Journal of the Chemical Society Chemical Communications

Year:

1984

Language:

english

File:

PDF, 132 KB

english, 1984

40

Antiadhesion considerations for UV nanoimprint lithography

Houle, F. A., Rettner, C. T., Miller, D. C., Sooriyakumaran, R.

Journal:

Applied Physics Letters

Year:

2007

Language:

english

File:

PDF, 306 KB

english, 2007

41

Temperature dependence of the third-order nonlinear optical susceptibilities in polysilanes and polygermanes

J. Baumert, G. C. Bjorklund, D. H. Jundt, M. C. Jurich, H. Looser, R. D. Miller, J. Rabolt, R. Sooriyakumaran, J. D. Swalen, R. J. Twieg

Year:

1988

Language:

english

File:

PDF, 659 KB

english, 1988

42

Transfer etching of bilayer resists in oxygen-based plasmas

A. P. Mahorowala, K. Babich, Q. Lin, D. R. Medeiros, K. Petrillo, J. Simons, M. Angelopoulos, R. Sooriyakumaran, D. Hofer, G. W. Reynolds, J. W. Taylor

Year:

2000

Language:

english

File:

PDF, 1.50 MB

english, 2000

43

[IEEE 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) - Shanghai, China (2010.11.1-2010.11.4)] 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology - Patternable low-кmaterial for “greener” semiconductor manufacturing

Lin, Qinghuang, Chen, S.T., Nelson, A., Brock, P., Cohen, S., Davis, B., Fuller, N., Gambino, J., Kaplan, R., Kwong, R., Liniger, E., Neumayer, D., Patel, J., Shobha, H., Sooriyakumaran, R., Purushoth

Year:

2010

Language:

english

File:

PDF, 939 KB

english, 2010

44

Sphingosine-1-phosphate lyase potentiates apoptosis via p53- and p38-dependent pathways and is down-regulated in colon cancer

Oskouian, B., Sooriyakumaran, P., Borowsky, A. D., Crans, A., Dillard-Telm, L., Tam, Y. Y., Bandhuvula, P., Saba, J. D.

Journal:

Proceedings of the National Academy of Sciences

Year:

2006

Language:

english

File:

PDF, 990 KB

english, 2006

45

Sphingosine-phosphate Lyase Enhances Stress-induced Ceramide Generation and Apoptosis

Reiss, U., Oskouian, B., Zhou, J., Gupta, V., Sooriyakumaran, P., Kelly, S., Wang, E., Merrill, A. H., Saba, J. D.

Journal:

Journal of Biological Chemistry

Year:

2004

Language:

english

File:

PDF, 443 KB

english, 2004

46

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Reactive ion etching of 193-nm resist candidates: current platforms and future requirements

Wallow, Thomas I., Brock, Phillip J., Di Pietro, Richard A., Allen, Robert D., Opitz, Juliann, Sooriyakumaran, Ratnam, Hofer, Donald C., Meute, Jeff, Byers, Jeff D., Rich, Georgia K., McCallum, Martin

Year:

1998

Language:

english

File:

PDF, 739 KB

english, 1998

47

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Line edge roughness reduction by plasma curing photoresists

Mahorowala, Arpan P., Chen, Kuang-Jung, Sooriyakumaran, Ratnam, Clancy, Aleksandra, Murthy, Dakshi, Rasgon, Stacy, Sturtevant, John L.

Year:

2005

Language:

english

File:

PDF, 3.30 MB

english, 2005

48

The metabolic syndrome and cancer: Is the metabolic syndrome useful for predicting cancer risk above and beyond its individual components?

Harding, J., Sooriyakumaran, M., Anstey, K.J., Adams, R., Balkau, B., Briffa, T., Davis, T.M.E., Davis, W.A., Dobson, A., Giles, G.G., Grant, J., Knuiman, M., Luszcz, M., Mitchell, P., Pasco, J.A., Re

Journal:

Diabetes & Metabolism

Year:

2015

Language:

english

File:

PDF, 567 KB

english, 2015

49

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications

De Silva, Anuja, Allen, Robert D., Somervell, Mark H., Sundberg, Linda K., Sooriyakumaran, Ratnam, Bozano, Luisa, Breyta, Greg, Hinsberg, William D., Fujiwara, Masaki

Year:

2011

Language:

english

File:

PDF, 803 KB

english, 2011

50

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Positive bilayer resists for 248- and 193-nm lithography

Sooriyakumaran, Ratnam, Wallraff, Gregory M., Larson, Carl E., Fenzel-Alexander, Debra, Di Pietro, Richard A., Opitz, Juliann, Hofer, Donald C., LaTulip, Jr., Douglas C., Simons, John P., Petrillo, Ka

Year:

1998

Language:

english

File:

PDF, 1.68 MB

english, 1998